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Strength Distributions in Polycrystalline Silicon MEMS

The strength distribution was found to be dependent on the length of the tensile structures, as expected by the Weibull size effect, and unexpectedly strongly dependent on the layer from which the tensile bar was constructed. Specifically, the topmost polysilicon layer in the deposition process (poly4) was more than twice the strength of the bottom freestanding polysilicon layer (poly1). The mechanistic

Strength Reliability of Micro Polycrystalline Silicon

In order to evaluate strength reliability of micron size polycrystalline silicon (poly-Si) structure for microelectromechanical systems (MEMS), bending strength tests of cantilever beam, Weibull analysis of the strength and fracture surface analysis are performed.

The strength of polycrystalline silicon at the micro- and

A new method for tensile testing of thin films by means of an improved apparatus has been developed to measure the elastic properties (Young's modulus, tensile strength) of surface micromachined polycrystalline silicon specimens. The newly designed tensile tester makes use of an Ultraviolet (UV) light curable adhesive to clamp micron-sized specimens. The properties determination

Polycrystalline Silicon an overview ScienceDirect Topics

Polycrystalline silicon carbide (SiC) has been extensively used in the ceramics industry and is mainly known for its mechanical strength and refractory characteristics. Hence, it is extensively used as a grinding agent and a refractory high-strength coating in machining tools.

Fracture Strength of Polycrystalline Silicon MRS Online

10/02/2011 The Berkeley polysilicon exhibited a fracture strength of 1.2% ± 0.1%, a difference from the MUMPS result that is statistically significant. Also, no statistical difference in fracture strength was measured on specimens that were super-critically carbon dioxide dried as opposed to furnace dried.

Fracture Strength of Polycrystalline Silicon Wafers for

The fracture strength of polycrystalline silicon wafers has been investigated by means of twist and four‐point bending tests. Under a twisting configuration, which generates high tensile stresses within the middle of the wafers, a unimodal distribution in strength is obtained. The characteristic strength and Weibull modulus are 131.0 MPa, and 14.4, respectively. Under a four‐point bending configuration,

Fracture Strength of Polycrystalline Silicon

The Berkeley polysilicon exhibited a fracture strength of 1.2% ± 0.1%, a difference from the MUMPS result that is statistically significant. Also, no statistical difference in fracture strength was...

Strength Distributions in Polycrystalline Silicon MEMS

Strength Distributions in Polycrystalline Silicon MEMS Abstract: Safe and reliable design of MEMS components requires a statistical description of the material properties that are associated with failure. To this end, a series of microscale tensile tests was performed on polysilicon MEMS structures fabricated using Sandia National Laboratories' SUMMiT Vtrade process. Tensile bars were

Fracture Strength of Polycrystalline Silicon MRS Online

Fracture Strength of Polycrystalline Silicon Volume 518 P.T. Jonestt, G.C. Johnsontt, R.T. Howe Skip to main content We use cookies to distinguish you from other users and to provide you with a better experience on our websites.

Polycrystalline Silicon an overview ScienceDirect Topics

Polycrystalline silicon carbide (SiC) has been extensively used in the ceramics industry and is mainly known for its mechanical strength and refractory characteristics. Hence, it is extensively used as a grinding agent and a refractory high-strength coating in machining tools. In recent years, there has been widespread interest in the fabrication of epitaxial single-crystal SiC for use as a

Fracture Strength of Polycrystalline Silicon Wafers for

The fracture strength of polycrystalline silicon wafers has been investigated by means of twist and four‐point bending tests. Under a twisting configuration, which generates high tensile stresses within the middle of the wafers, a unimodal distribution in strength is obtained. The characteristic strength and Weibull modulus are 131.0 MPa, and 14.4, respectively. Under a four‐point bending

Strength Reliability of Micro Polycrystalline Silicon

In order to evaluate strength reliability of micron size polycrystalline silicon (poly-Si) structure, bending tests of cantilever beam and Weibull analysis are performed. Recently, the importance of microelectromechanical systems (MEMS) in society is increasing, and the number of production is also increasing. The MEMS devices, which contain mechanical movement, have to maintain their

Seamless interpretation of the strength and fatigue

Thin film polycrystalline silicon was subjected to strength and fatigue tests. A model is proposed which correlates the strength of this material under monotonic loading and its fatigue lifetime under cyclic loading in a seamless manner on a three-dimensional surface. This surface describes the cumulative failure probability as a function of both applied stress and fatigue cycles. In the

Tensile Strength and Fracture Toughness of Surface

We applied this tester for polycrystalline silicon (poly-Si) thin films prepared under various conditions. The microstructure of the film is controlled by the crystallizing temperature. The process conditions and the microstructures that contribute to the strength of poly-Si film are identified by the tensile strength and the fracture toughness.

Fracture Strength of Polycrystalline Silicon Wafers for

09/09/2009 Fracture Strength of Polycrystalline Silicon Wafers for the Photovoltaic Industry. Authors. Oscar Borrero-López,

Polycrystalline Silicon Wafers University silicon Wafer

Polycrystalline silicon is the most commonly used material for silicon solar cells. The slicing process is the first mechanical processing step of battery cells, the quality of sawn surface affects the cost of subsequent processes such as texture making, also affects the breaking strength of battery cells and the photoelectric conversion efficiency and other performances. In this paper

Failure of Silicon: Crack Formation and Propagation

Polycrystalline Silicon Environmentally-Assisted Cracking in Polycrystalline Silicon Bagdahn and Sharpe (2002) unpublished • micron-scale silicon films display some evidence of time-delayed failure under sustained (non-cyclic) loading • lives for thin-film silicon are somewhat shorter in water • no evidence of such time-

Polycrystalline Silicon an overview ScienceDirect Topics

Polycrystalline silicon carbide (SiC) has been extensively used in the ceramics industry and is mainly known for its mechanical strength and refractory characteristics. Hence, it is extensively used as a grinding agent and a refractory high-strength coating in machining tools. In recent years, there has been widespread interest in the fabrication of epitaxial single-crystal SiC for use as a

Strength of polycrystalline silicon carbide SpringerLink

Strength of polycrystalline silicon carbide. G. S. Oleinik 1 & M. L. Gorb 1 Soviet Powder Metallurgy and Metal Ceramics volume 13, pages 1014 1017 (1974)Cite this article. 22 Accesses. This is a preview of subscription content, log in to check access. Access options Buy single article. Instant access to the full article PDF. US$ 39.95. Price includes VAT for USA. Subscribe to journal

Abnormality in fracture strength of polycrystalline silicene

mechanical properties of polycrystalline silicene remainlargelyunexplored.Forpolycrystallinemateri-als, grain size is one of the key factors influencing mechanical properties such as in-plane stiffness, fracture strength etc [14, 15]. Compared with DFT, moleculardynamics(MD)isanidealmethodtostudy the mechanical properties of polycrystalline

OS5-2-4 Strength Reliability of Micro Polycrystalline

In order to evaluate strength reliability of micron size polycrystalline silicon (poly-Si) structure for MEMS, bending strength tests of cantilever beam, Weibull analysis of the strength and fracture surface analysis are performed. Recently, the importance of microelectromechanical systems (MEMS) in society is increasing, and the number of production is also increasing. The MEMS devices, which

Tensile Strength and Fracture Toughness of Surface

We applied this tester for polycrystalline silicon (poly-Si) thin films prepared under various conditions. The microstructure of the film is controlled by the crystallizing temperature. The process conditions and the microstructures that contribute to the strength of poly-Si film are identified by the tensile strength and the fracture toughness.

Fracture Strength of Polycrystalline Silicon Wafers for

09/09/2009 Fracture Strength of Polycrystalline Silicon Wafers for the Photovoltaic Industry. Authors. Oscar Borrero-López,

(PDF) Specimen size effect on tensile strength of surface

Specimen size effect on tensile strength of surface-micromachined polycrystalline silicon thin films

Polycrystalline Silicon AMERICAN ELEMENTS

SECTION 1. IDENTIFICATION. Product Name: Polycrystalline Silicon Product Number: All applicable American Elements product codes, e.g. SI-PX-04-I,SI-PX-04-P,SI-PX-05-I,SI-PX-05-p CAS #: 7440-21-3 Relevant identified uses of the substance: Scientific research and development Supplier details: American Elements 10884 Weyburn Ave.

Polycrystalline Silicon Wafers University silicon Wafer

Polycrystalline silicon is the most commonly used material for silicon solar cells. The slicing process is the first mechanical processing step of battery cells, the quality of sawn surface affects the cost of subsequent processes such as texture making, also affects the breaking strength of battery cells and the photoelectric conversion efficiency and other performances. In this paper

Specimen size effect on tensile strength of surface

A new tensile tester using an electrostatic-force grip was developed to evaluate the tensile strength and the reliability of thin-film materials. The tester was constructed in a scanning electron microscope (SEM) chamber for in situ observation and was applied for tensile testing of polycrystalline silicon (poly-Si) thin films with dimensions of 30-300 /spl mu/m long, 2-5 /spl mu/m wide, and 2